专利名称：MICROORGANISM CULTURE METHOD AND
CULTURE DEVICE
发明人：ISHII Tetsuya,SATOU Kanetomo,FUJIMORI
Yoji,HAMACHI Kokoro,NISHIYAMA Norihide
申请号：EP15841770.9申请日：20150914公开号：EP3199619A1公开日：20170802
专利附图：
摘要：Gas-utilizing microorganisms are stably cultured regardless of variations in asupply flow rate of a substrate gas. Gas-utilizing microorganisms 3 are cultured in a
culture solution 2 in a culture tank 10. A substrate gas containing CO and H or the like issupplied to the culture tank 10 and is dissolved in the culture solution 2. When a supplyflow rate of the substrate gas or predetermined constituents of the substrate gas to theculture tank 10 becomes a predetermined value or lower, a culture solution 2a is rapidlydischarged from the culture tank 10.
申请人：Sekisui Chemical Co., Ltd.
地址：4-4, Nishitemma 2-chome Kita-ku Osaka-shi, Osaka 530-8565 JP
国籍：JP
代理机构：Merkle, Gebhard
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