专利名称：Precision automatic mask-wafer alignment
system
发明人：John L. Bartelt,Ross D. Oleny申请号：US06/940390申请日：19861211公开号：US04728193A公开日：19880301
摘要：An interferometric alignment and position detector system for determiningrelative location of an object is provided. A composite diffraction grating is provided withthe object. A laser can provide a collimated coherent light beam directed so as toimpinge on the composite diffraction grating. A beam splitter can collect at least twopairs of diffracted light beams from the composite diffraction grating and can combinethe pairs of diffracted light beams to provide interference fringe patterns. Apparatus isprovided for detecting the interference fringe patterns to provide a measurement of theintensity distribution from which the relative location can be established.
申请人：HUGHES AIRCRAFT COMPANY
代理人：Wanda K. Denson-Low,A. W. Karambelas
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容