专利名称：Antimicrobial cleansing compositions发明人：Kimberly Ann Biedermann,Jeffrey Michael
Morgan,Karl Shiqing Wei,Mark RichardSine,Cheyne P. Thomas,David EdmundTarantino,Christopher Irwin,ChristopherDean Putman,Peter William Beerse
申请号：US09738365申请日：20001215
公开号：US20020002124A1公开日：20020103
摘要：Disclosed are antimicrobial cleansing compositions that have a pH of fromabout 2.0 to about 5.5 and comprise an antimicrobial agent, an amphoteric surfactant, and2-pyrrolidone-5 carboxylic acid as a proton donating agent. Also disclosed arecorresponding articles of manufacture and methods of cleansing the skin using thedescribed compositions. The compositions are mild to the skin and provide improvedantimicrobial benefits to the skin.
申请人：BIEDERMANN KIMBERLY ANN,MORGAN JEFFREY MICHAEL,WEI KARL
SHIQING,SINE MARK RICHARD,THOMAS CHEYNE P.,TARANTINO DAVID EDMUND,IRWINCHRISTOPHER,PUTMAN CHRISTOPHER DEAN,BEERSE PETER WILLIAM
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