专利名称：Method for preparing samples for imaging发明人：Michael Schmidt,Jeffrey Blackwood,Stacey
Stone,Sang Hoon Lee,Ronald Kelley
申请号：US14144902申请日：20131231公开号：US08822921B2公开日：20140902
专利附图：
摘要：A method and apparatus is provided for preparing samples for observation in acharged particle beam system in a manner that reduces or prevents artifacts. Material isdeposited onto the sample using charged particle beam deposition just before or during
the final milling, which results in an artifact-free surface. Embodiments are useful forpreparing cross sections for SEM observation of samples having layers of materials ofdifferent hardnesses. Embodiments are useful for preparation of thin TEM samples.
申请人：FEI Company
地址：Hillsboro OR US
国籍：US
代理机构：Scheinberg & Associates, P.C.
代理人：Michael O. Scheinberg
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