专利名称：Process and device for the interferometric
measurement of changing film thicknesses
发明人：Gaston, Charles Arden,Kirk, Joseph
Pennell,Wasik, Chester Alexander
申请号：EP79104231.0申请日：19791031公开号：EP0011723A1公开日：19800611
专利附图：
摘要：the test transparent layer (12) is irradiated with white light under constantangle of incidence and the intensity of two selectedmutually different wavelengths in the
reflected light is registered.inter ferenzerscheinungen in the layer with continuousdicken\änderung lead to periodic intensit\ätsschwankungen at two
wavelengths. by comparison of the two intensit\ätskurven (e.g.coinciding extremitiesa, b. c), the absolute thickness of clearly defined, although the ausgangsdicke layer onlywithin a certain range is known.to simplify the phasenvergleichs of two cyclicintensit\ätsmuster, the wavelengths are selectedthat certain extremities bothsignals in a thickness coincidethe lower than the expected minimum anfangsdicke andthat for larger thicknesses up to and including the maximum expected anfangsdicke, nocoincidence occurs.the procedure is both additive and subtractive changes the
thickness).the establishment of the schichtdickenmessung contains schmalbandfilter (31,32) with schiefem strahleinfall as the strahlteiler effect.
申请人：International Business Machines Corporation
地址：Old Orchard Road Armonk, N.Y. 10504 US
国籍：US
代理机构：Teufel, Fritz, Dipl.-Phys.
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