专利名称：DESIGN-MANUFACTURING INTERFACE VIA
A UNIFIED MODEL
发明人：PIERRAT, Christophe,WONG, Alfred, Kwok-Kit
申请号：US2004033092申请日：20041007公开号：WO05/036603P1公开日：20050421
摘要：Subtleties of advanced fabrication processes and nano-scale phenomenaassociated with integrated circuit miniaturization have exposed the insufficiencies ofdesign rules. Such inadequacies have adverse impact on all parts of the integrated circuitcreation flow where design rules are used. In addition, segregation of the various layoutdata modification steps required for deep sub-micrometer manufacturing are resulting inslack and inefficiencies. This invention describes methods to improve integrated circuitcreation via the use of a unified model of fabrication processes and circuit elements thatcan complement or replace design rules. By capturing the interdependence amongfabrication processes and circuit elements, the unified model enables efficient layoutgeneration, resulting in better integrated circuits.
申请人：PIERRAT, Christophe,WONG, Alfred, Kwok-Kit
地址：US,US,US
国籍：US,US,US
代理机构：HAYNES, Mark, A.
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