专利名称：PLASMA PROCESSING METHOD AND
APPARATUS, CONTROL PROGRAM ANDSTORAGE MEDIUM
发明人：Masahiro OGASAWARA申请号：US11689840申请日：20070322
公开号：US20070224709A1公开日：20070927
专利附图：
摘要：A plasma processing method for performing a plasma process by employing aplasma processing apparatus including a processing chamber for performing the plasma
process on a target object, a mounting table for mounting thereon the target object inthe processing chamber, a peripheral member disposed around a periphery of themounting table, and a voltage application unit. The voltage application unit applies avoltage to the peripheral member based on an amount of abrasion of the peripheralmember, a result of a pre-performed processing or a variation of an electric field formedover the peripheral member.
申请人：Masahiro OGASAWARA
地址：Nirasaki-shi JP
国籍：JP
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