Method and apparatus for investigating the physica

专利名称：Method and apparatus for investigating the

physical properties of material surface layer

发明人：Hidetsugu Ikegami申请号：US08/844107申请日：19970428公开号：US05753914A公开日：19980519

摘要：An improved method is disclosed which investigates the surface layer of amaterial. A pulsed slow positron beam having a pulse duration in a nanosecond range isfocused and irradiated on the reverse surface of a thin-film-like sample, and a probe isbrought into contact with the front surface of the sample. Surface positrons are swarmedin a gap space at the contact point so as to form positronium molecules Ps.sub.n (n is aninteger equal to or greater than 2). Coherent annihilation gamma-rays generated due toannihilation of the positronium molecules Ps. sub.n are detected so as to discriminate thepositronium molecules Ps. sub.n from positrons and positroniums Ps, thereby measuringon an atomic scale the physical properties of the surface layer of the material with aresponse time shorter than 1 nanosecond. This method makes it possible to measure onan atomic scale the state of local electrons at a surface layer of a material and activitiesat the surface layer, such as catalytic activity, with a response time shorter than 1nanosecond.

申请人：JAPAN SCIENCE AND TECHNOLOGY CORPORATION

代理机构：Lorusso & Loud

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