专利名称：Thin film magnetic head and method for
fabricating the same
发明人：Noriyuki Ito,Kosuke Tanaka,Koichi Terunuma申请号：US10153689申请日：20020524公开号：US06751070B2公开日：20040615
专利附图：
摘要：A first and a second longitudinal bias-applying films are formed via a first maskat both sides of a magnetoresistive effective element film so that the difference insurface level between the magnetoresistive effective element film and the first and the
second longitudinal bias-applying films is set within ±20 nm. Then, a first and a secondelectrode films are formed so as to cover edge portions of the magnetoresistiveeffective element film and the first and the second longitudinal bias-applying films.
申请人：TDK CORPORATION
代理机构：Oliff & Berridge, PLC
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