Sputtering apparatus including cathode with rotata

专利名称：Sputtering apparatus including cathode with

rotatable targets, and related methods

发明人：Schloremberg, Marcel,Comans,

Guy,Uselding, Philippe

申请号：EP10170789.1申请日：20100726公开号：EP2280407A2公开日：20110202

摘要：Certain example embodiments relate to sputtering apparatuses that include aplurality of targets (56a-d) such that a first one or ones of target(s) may be used forsputtering in a first mode, while a second one or ones of target(s) may be used forsputtering in a second mode. Modes may be switched in certain example embodimentsby rotating the position of the targets, e.g., such that one or more target(s) (56a,56b) tobe used protrude into the main chamber of the apparatus, while one or more target(s)(56c,56d) to be unused are recessed into a body portion of a cathode (52) of (e.g.,

integrally formed with) the sputtering apparatus. The targets may be cylindrical magnetictargets or planar targets. At least one target location also may be made toaccommodate an ion beam source.

申请人：Centre Luxembourgeois de Recherches pour le Verre et la Céramique S.A.

地址：Zone Industrielle Wolser 3452 Dudelange LU

国籍：LU

代理机构：Hess, Peter K. G.

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