专利名称：A magnetron sputtering coating device and
the preparation method of a nano-multilayer film
发明人：Jin, Gong,Tu, Jiangping,Li, Lingling,Wang,
Gang,Wang, Meina
申请号：EP12250163.8申请日：20121019公开号：EP2664690B1公开日：20150916
摘要：A magnetron sputtering coating device is provided, characterized in thefollowing aspects: The device at least includes a deposition chamber, sputteringcathodes, a rotating stand on the base of the deposition chamber and a work steady onthe rotating stand, as well as a first rotation system for driving the rotating stand torotate around the central axis of the rotating stand; the sputtering cathode, arrangedaround and perpendicular to the rotating stand, includes two first sputtering cathodesand one second sputtering cathode, and is located on a circumference concentric with therotating stand; there is an arc of 180°-240° between the two first sputtering cathodes,which is equally divided by the second sputtering cathode; a baffle through the surface ofthe rotating stand is fixedly arranged on the rotating stand, having both ends beyondboth ends of the sputtering cathode in the direction perpendicular to the rotating stand.The device is simple in structure and process control, and realizes preparation of thenano-multilayer film, suitable for industrialization.
申请人：ZHONGAO HUICHENG TECHNOLOGY CO LTD
地址：CN
国籍：CN
代理机构：Atkinson, Ralph
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