MANUFACTURE FILTRATION ELEMENTS

专利名称：MANUFACTURE FILTRATION ELEMENTS发明人：KWOK, KLEO申请号：EP08729071申请日：20080205公开号：EP2111274A4公开日：20100915

摘要：Selective etching techniques are used to manufacture a basic filtration element,which can then be used as a basis for constructing various devices for differentapplications. In this process, sheets of etchable material are etched from one or bothsides of that sheet to form channels in a premasked pattern, which controls the minimumopening of the filtration element. The desired channel opening is only limited by thecapability of the photochemical etching system being used. Alternatively, a filter elementmay be made by rolling or extruding a first sheet to form a plurality of recessed areasbordered by lands, selectively etching or punching through the recessed pattern areas,and bonding a second sheet having a plurality of etched or punched through areas to thefirst sheet, and, aligning the etched through areas to the second sheet with the recessedareas of the first sheet.

申请人：INVENGINEERING ENTERPRISES, LLC

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